Toray Industries, Inc. has begun advance sales of its TBW-XHR series of reverse osmosis (RO) membrane elements, designed to double urea removal efficiency in producing ultrapure water from recycled wastewater. These high-removal, low-pressure elements are aimed at meeting the growing demand for ultrapure water in semiconductor manufacturing, where water quality is critical for processes such as photolithography. The new membranes address challenges related to urea and other impurities that can impact water purity and manufacturing standards.
The TBW-XHR series achieves nearly 90% urea removal, according to internal evaluations, offering improved removal rates for challenging impurities like boron and alcohols while maintaining high water production rates at low pressures. Developed with proprietary membrane technology from the Toray Research Center, Inc., these elements aim to support a stable supply of ultrapure water and may play a key role in recycled wastewater systems and future ultrapure water facilities.
The company has initially targeted domestic water treatment engineering firms that serve the semiconductor and electronics industries and plans to expand applications to international markets, including desalination and wastewater reclamation. Toray will showcase this technology at the International Desalination and Reuse Association conference in December, aiming to highlight the role of advanced RO membranes in sustainable water treatment solutions.
For more information